JBD demonstrates 2-million nits and 10,000 PPI Micro-LED microdisplays

Shanghai-based Micro-LED microdisplay developer JBD unveiled its latest Micro-LED microdisplay prototypes. JBD's panels can achieve a high brightness of 2 million nits coupled with very high pixel density (5,000 PPI) on a monochrome green display.

JBD also demonstrated an even high pixel density display (10,000 PPI). JBD can currently produce either monochrome or dual-color (red and green) microdisplays, and is developing full-color ones.

Plessey and JDC demonstrate a Full-HD monolithic micro-LED microdisplay

In 2018, UK-based GaN-on-Si MicroLED developer Plessey Semiconductor announced a strategic partnership with Taiwan's s Jasper Display Corp (JDC). Under the partnership, Plessey will use JDC's silicon backplane to drive its monolithic micro-LED displays.

Today JDC and Plessey demonstrated the world's first GaN-on-Silicon monolithic full-HD (1920x1080) microLED bonded display. Plessey says that it has succeeded in wafer level bonding of its GaN-on-Silicon monolithic microLED wafers with JDC’s eSP70 silicon patented backplane technology, resulting in microLED displays that contain addressable LEDs. The pixel pitch of this display is 8 microns and the JDC backplane provides independent 10-bit single color control of each pixel.

Plessey developed its process to produce native GaN-on-Si green micro-LEDs

UK-based GaN-on-Si MicroLED developer Plessey Semiconductor developed its proprietary 2D planar gallium nitride on silicon (GaN-on-Si) process to emit Green light without the need for color conversion techniques.

Plessey native GaN-on-Si green micro LEDs photo

Plessey says that its native Green LEDs are formed inherently using its proprietary GaN-on-Si epitaxial growth process similar to the native Blue LEDs with the principal difference coming in the amount of indium that is incorporated in the quantum well structures of the LED. The native Green emission is orders of magnitude times brighter than color-converted process for micro-LEDs.

Aledia orders more Micro-LED production equipment from Veeco

In July 2018, France-based 3D GaN LED developer Aledia announced that it has selected Veeco Instruments’s Propel GaN MOCVD system to support its advanced R&D. Veeco's Propel system enables Aledia to process 6- and 8-inch wafers or 2- to 4-inch wafers in a minibatch mode. Aledia also uses Veeco's R&D K465i MOCVD system.

Veeco Propel GaN MOCVD system photo

Aledia and Veeco now announced that Aledia "expands its portfolio of Veeco equipment to develop and produce 3D micro-LEDs". It is not clear what kind of equipment Aledia ordered - and it also seems that the two companies are collaborating to develop next-generation Micro-LED production equipment.

Glo demonstrate its LTPS and CMOS MicroLED displays

US and Sweden based Glo has been developing Micro-LED displays on both LTPS and CMOS (microdisplay) backplanes for many years. The company has been rather queit until now (even though the 2017 investment from Google created some buzz).

Glo: MicroLED vs OLED, LTPS demo 2019

Glo has now started to disclose its technology and achievements. At CES 2019, Glo demonstrated two displays. First up is the 1.5-inch smartphone type display you can see in the image above. The 264 PPI 120Hz display is produced on a LTPS backplane and produces 4,000 nits brightness - you can see how it is much brighter compared to the LGD OLED in the Apple Watch next to it (1,000 nits max).

PlayNitride and Aixtron to collaborate on Micro-LED development

Aixtron and PlayNitride signed a joint-collaboration agreement to accelerate Micro-LED development. Aixtron will deliver an AIX G5+ C MOCVD system to Playnitride, that will be used to produce GaN-based Micro LED devices.

Aixtron G5+ C MOCVD system photo

Aixtron says that the G5+ C is an advanced advanced production tool that offers market leading wavelength uniformity to meet the tightened Micro LED market specifications in a batch reactor high-throughput environment. The system allows for the lowest defect and particle level in the industry due to an effective in-situ cleaning technology and the cassette-to-cassette handler which is essential for high yields. The G5+ C MOCVD was recently ordered by Plessey for its own GaN-on-Silicon Micro-LED development and production.

Plessey purchased EVG's production wafer bonding system

UK-based GaN-on-Si MicroLED developer Plessey Semiconductor announced a collaboration with EV Group (EVG), a wafer bonding and lithography equipment producer. As part of the agreement, Plessey purchased EVG's GEMINI production wafer bonding system to enable bonding and alignment at Plessey’s fabrication facility in Plymouth, UK.

Plessey's EVG -Gemini production wafer bonding system photo

Plessey says that the new system will enable it to bond its GaN-on-Si microLED arrays to the panel’s backplane at a wafer level. Plessey also says that EVG’s patented automated bond alignment system technology is suitable for Plessey’s requirements because it allows face-to-face alignment of the wafers with very high precision which will enable very small pixel sizes.

ALLOS and Veeco demonstrated the reproducibility of ALLO's GaN-on-Si epiwafer technology for uniform Micro-LED production

In November 2017 Veeco and ALLOS Semiconductors announced that the two companies have completed their micro-LED strategic initiative and demonstrated 200mm GaN-on-Si wafers for blue and green micro-LED production. ALLOS proprietary epitaxy technology was transferred onto Veeco's Propel Single-Wafer MOCVD System to enable micro-LED production on existing silicon production lines.

ALLOS GaN-on-Si wafer photo

Yesterday ALLOS and Veeco announced the completion of another phase of their mutual effort to provide the industry with leading GaN-on-Silicon epiwafer technology for microLED production. The two companies now demonstrated the reproducibility of ALLOS’ 200 mm GaN-on-Si epiwafer technology on Veeco’s Propel MOCVD reactor when producing epiwafers for many prominent global consumer electronics companies.