France-based 3D GaN LED developer Aledia has selected Veeco Instrumentsâs Propel GaN metal-organic chemical vapor deposition (MOCVD) system to support its advanced R&D. Aledia aims to scale up its technology for large-area silicon using Veeco's system.
Veeco's Propel system will enable Aledia to process 6- and 8-in. wafers or 2- to 4-in. wafers in a minibatch mode. Aledia already uses Veeco's K465i MOCVD system.
Posted: Jul 08,2018 by Ron Mertens