Innovation Semiconductor
US-based Innovation Semiconductor developed (and patented) a monolithic vertical architecture for the production of MicroLED microdisplays, based on a 3D nanowire structure, a single material system and a straightforward and conventional integration between LEDs and GaN transistor.
The company seems to be at an early stage, and has yet to demonstrate its technology.
Contact information for Innovation Semiconductor
Company Address
260 E Main St Ste 2701
Rochester, NY 14604
United States