US-based Verticle Inc. has developed "defect-free wet chemical etching", a new process that can be used to etch AlGaInP red microLEDs, with an improved performance and results compared to dry etching. In order to adopt its red micro-LED wet etching technology in micro-LED manufacturing process and expedite micro-LED commercialization, Verticle is now offering wet etching foundry service for microLED developers and display and chip makers.
Sidewall defect penetration depth of the 30x30 mm AlGaInP microLEDs (wet vs dry etching, no prost-etch treatment)
The company says that its unique defect-free wet etching process can enhance red microLED efficiency by preventing defect generation in the red pixel sidewall, hence, minimizing sidewall defect penetration depth. As a result, effective light emitting area is 3 times bigger than dry etched pixel (see above).
Wet etched AlGaInP microLED shows very smooth surface and sidewall is highly anisotropic after 1.4 mm-deep mesa etching
Verticle also has successfully demonstrated highly anisotropic etch profile without significant undercuts by wet etching, enabling sub-10 µm chip fabrication and atomically smooth etched surface, which are very crucial to fabricate small pixel red micro-LED.
Verticle says that key benefits of AlGaInP red micro-LED wet etching include enhanced micro-LED efficiency by resolving “size effect” bottleneck, hence superior performance for small pixel displays, low CAPEX, and massively high throughput.
For more information, please contact:
Mike Yoo, CEO
mcyoo@verticle-inc.com
www.verticle-inc.com