Veeco Instruments produces processs equipment for several markets, mainly the LED, PV and data storage markets.
For the display market Veeco provides Metal Organic Chemical Vapor Deposition (MOCVD) equipment and Molecular Beam Epitaxy (MBE) products. The company's MOCVD deposition equipment can be used for microLED production, and the company sold several such systems to microLED developers.
The latest Veeco MicroLED news:
German-based GaN-on-Si developer ALLOS has applied its technology to large 300 mm epiwafers. ALLOS says that scaling up to 300 mm wafers enables higher production efficiencies and thus lower costs. ALLOS estimates that the higher area utilization alone accounts for a cost advantage of 40% compared to standard LED wafers. Standard 300 mm silicon line tools also offer higher production uniformity and yield.
ALLOS demonstrated the 300 mm scale-up using a reactor made by Veeco who announced selling the first 300 mm GaN reactor to a leading-edge semiconductor fab just some month ago and also showed 300 mm wafer data at CES. ALLOS reports a wavelength uniformity of consistently below 1 nm and "all other production requirements like bow of < 40 µm and SEMI-standard thickness of 725 µm". ALLOS says scaling to 300 mm shows how robust its GaN-On-Si technology is.
In July 2018, France-based 3D GaN LED developer Aledia announced that it has selected Veeco Instruments’s Propel GaN MOCVD system to support its advanced R&D. Veeco's Propel system enables Aledia to process 6- and 8-inch wafers or 2- to 4-inch wafers in a minibatch mode. Aledia also uses Veeco's R&D K465i MOCVD system.
Aledia and Veeco now announced that Aledia "expands its portfolio of Veeco equipment to develop and produce 3D micro-LEDs". It is not clear what kind of equipment Aledia ordered - and it also seems that the two companies are collaborating to develop next-generation Micro-LED production equipment.
ALLOS and Veeco demonstrated the reproducibility of ALLO's GaN-on-Si epiwafer technology for uniform Micro-LED production
In November 2017 Veeco and ALLOS Semiconductors announced that the two companies have completed their micro-LED strategic initiative and demonstrated 200mm GaN-on-Si wafers for blue and green micro-LED production. ALLOS proprietary epitaxy technology was transferred onto Veeco's Propel Single-Wafer MOCVD System to enable micro-LED production on existing silicon production lines.
Yesterday ALLOS and Veeco announced the completion of another phase of their mutual effort to provide the industry with leading GaN-on-Silicon epiwafer technology for microLED production. The two companies now demonstrated the reproducibility of ALLOS’ 200 mm GaN-on-Si epiwafer technology on Veeco’s Propel MOCVD reactor when producing epiwafers for many prominent global consumer electronics companies.
France-based 3D GaN LED developer Aledia has selected Veeco Instruments’s Propel GaN metal-organic chemical vapor deposition (MOCVD) system to support its advanced R&D. Aledia aims to scale up its technology for large-area silicon using Veeco's system.
Veeco's Propel system will enable Aledia to process 6- and 8-in. wafers or 2- to 4-in. wafers in a minibatch mode. Aledia already uses Veeco's K465i MOCVD system.
Micro-LED microdisplay developer VueReal announced the initial closing of its $10.5 million Series A funding round, led by the venture arm of a large Asian company and a leading North American vendor focused on startups with emerging technology.
VueReal says that its proprietary sub-10 micrometer, high-efficiency micro-LED technology and its patented mass transfer process enables high-performance super low-power displays, coupled with a significant cost reduction.
Veeco and ALLOS Semiconductors have completed their micro-LED strategic initiative and demonstrated 200mm GaN-on-Si wafers for blue and green micro-LED production. Veeco transferred ALLOS' proprietary epitaxy technology onto Veeco's Propel Single-Wafer MOCVD System to enable micro-LED production on existing silicon production lines.
ALLOS says that it now has an MOCVD technology that is capable of high yielding GaN Epitaxy that meets all the requirements for processing micro-LED devices in 200 millimeter silicon production lines. Within one month the two companies managed to establish the ALLOS technology on Veeco's Propel systems and have achieved crack-free, meltback-free wafers with less than 30 micrometers bow, high crystal quality, superior thickness uniformity and wavelength uniformity of less than one nanometer.