ALD equipment maker Beneq announced Beneq its next-generation ALD platform designed for high-volume semiconductor manufacturing.
The new Beneq Transmute platform, is suitable for production of Wide Bandgap (WBG) power electronics, advanced RF devices - and microLED displays.
Beneq says that its Transmute systems extend the performance of the Beneq Transform XP platform into production environments with the company's proprietary 3-step ALD architecture. It combines plasma pre-treatment, plasma-enhanced ALD (PEALD), and thermal batch ALD to deliver conformal, high-performance dielectric stacks with atomic-level interface control at high throughput.
The Transmute systems includes flow-uniform 25-wafer chambers and advanced precursor dosing technology. It supports both thermal and plasma-enhanced ALD within a modular cluster architecture that enables dedicated configurations. With up to two transfer chambers and eleven process module slots – including PEALD, Thermal, Buffer, and Preheater – each system can be tailored to match specific customer applications and fab roadmaps while ensuring long-term scalability.
In July 2025, Beneq said that it is seeing significant progress in the microLED display market, and has received repeat orders from microLED technology developers.
