Aledia implements an AI system dedicated to the optimization of epitaxy processes

Aledia announced that it has successfully concluded the 3-years CLEDIA project, to integrate an artificial intelligence (AI) system dedicated to the optimization of epitaxy processes.

The The CLEDIA project, co-financed by the Auvergne-Rhône-Alpes Region and Bpifrance was a collaborative innovation between Pollen, Aledia and the laboratories at the University of Clermont Auvergne (LIMOS  and LMBP). 

Led by Pollen, a company specializing in AI-based process optimization software, CLEDIA has developed and deployed the SmartYIELD3 software platform, which is capable of automatically modeling and proposing new technological recipes from industrial data (Digital Twin). The technology has been tested in a real-world environment on several batches of wafers supplied by Aledia.

The core of the project was the use of artificial intelligence as a co-pilot for epitaxy experts.  SmartYIELD3 enabled the implementation of multi-objective prediction models, the exploration of process parameter space, and the proposal of optimized recipes, while integrating the physical and industrial constraints of the MOCVD epitaxy process.